Author:
Polkovnikov V N,Salashchenko N N,Svechnikov M V,Chkhalo N I
Abstract
Abstract
The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) region. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies on the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of Si and Be interlayers on the reflectivity is explained. Avenues for further research on beryllium-containing mirrors are discussed.
Publisher
Uspekhi Fizicheskikh Nauk (UFN) Journal
Subject
General Physics and Astronomy
Cited by
42 articles.
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