Numerical Analysis of Wafer Temperature with Respect to Radiation Variation in CVD Chamber-Reference-Cited by-同舟云学术

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Numerical Analysis of Wafer Temperature with Respect to Radiation Variation in CVD Chamber

Published:2024-08-15 Issue:4 Volume:33 Page:172-177
ISSN:2508-5107
Container-title:Journal of the Korean Society of Manufacturing Technology Engineers
language:en
Short-container-title:ksmte

Author:

You Seoung Kwan,Kim Seung Mo

Funder

Ministry of Trade, Industry and Energy

Korea Evaluation Institute of Industrial Technology

Korea University of Technology and Education

National Research Foundation of Korea

Publisher

The Korean Society of Manufacturing Technology Engineers

Reference5 articles.

1. Improvement of SiC deposition uniformity in CVD reactor by showerhead with baffle

2. Heat transfer analysis on wafer annealing process in semiconductor multi-wafer furnace using CFD simulation

3. A Mathematical Model for LPCVD in a Single Wafer Reactor

4. The effect of MAO processing time on surface properties and low temperature infrared emissivity of ceramic coating on aluminium 6061 alloy

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