Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure-Reference-Cited by-同舟云学术

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Polishing of optical media by dielectric barrier discharge inert gas plasma at atmospheric pressure

Published:2013-12-27 Issue: Volume:8 Page:
ISSN:1990-2573
Container-title:Journal of the European Optical Society: Rapid Publications
language:en
Short-container-title:JEOS:RP

Author:

Gerhard C.,Weihs T.,Luca A.,Wieneke S.,Viöl W.

Publisher

European Optical Society

Subject

Atomic and Molecular Physics, and Optics

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advances in finishing of optical complex substrates: A comprehensive review;Optics & Laser Technology;2024-09

2. Evaluation of plasma parameters’ impact on MRR and surface roughness in plasma polishing of fused silica: An investigation of surface characterization;Vacuum;2024-07

3. Development and Performance Evolution of Medium-Pressure He/SF6/O2-Based Plasma and Wet Chemical Etching Process for Surface Modification of Fused Silica;Plasma Chemistry and Plasma Processing;2024-02-05

4. Design and development of medium-pressure plasma process for optical substrate finishing: A comparative study with wet chemical etching;Journal of Manufacturing Processes;2024-01

5. Experimental and numerical study of the CO2 laser-polishing edge effect on silica surface;The International Journal of Advanced Manufacturing Technology;2023-07-27

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