Films Deposited from Reactive Sputtering of Aluminum Acetylacetonate Under Low Energy Ion Bombardment-Reference-Cited by-同舟云学术

Films Deposited from Reactive Sputtering of Aluminum Acetylacetonate Under Low Energy Ion Bombardment

Published:2017-04-10 Issue:4 Volume:20 Page:926-936
ISSN:1980-5373
Container-title:Materials Research
language:
Short-container-title:Mat. Res.

Author:

Battaglin Felipe Augusto Darriba¹,Prado Eduardo Silva¹,Caseli Luciano²,Silva Tiago Fiorini da³,Tabacniks Manfredo Harri³,Cruz Nilson Cristino da¹,Rangel Elidiane Cipriano¹

Affiliation:

1. Universidade Estadual Paulista, Brazil

2. Universidade Federal de São Paulo, Brazil

3. Universidade de São Paulo, Brazil

Publisher

FapUNIFESP (SciELO)

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

http://www.scielo.br/pdf/mr/v20n4/1516-1439-mr-1980-5373-MR-2016-0647.pdf

Reference34 articles.

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2. Characterization of a-phase aluminum oxide films deposited by filtered vacuum arc;Yamada-Takamura Y;Surface and Coatings Technology,2001

3. Chemical, morphological and nano-mechanical characterizations of Al2O3 thin films deposited by metal organic chemical vapour deposition on AISI 304 stainless steel;Natali M;Electrochimica Acta,2005

4. Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition;Cibert C;Thin Solid Films,2008

5. Preparation and characterization of aluminum oxide films by plasma enhanced chemical vapor deposition;Lin CH;Surface and Coatings Technology,1997

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