Author:
Aylett Bernard J.,Earwaker Lyndsay G.,Keen John M.
Abstract
ABSTRACTThin films of cobalt, rhenium, or cobalt silicide have been deposited down the pores of porous silicon layers, using HCo(CO)4, HRe(CO)5, and SiH3Co(CO)4 as precursors in a Chemical Vapour Infiltration and Decomposition (CVID) technique.
Publisher
Springer Science and Business Media LLC
Cited by
2 articles.
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