Novel polyelectrolyte–Al2O3/SiO2 composite nanoabrasives for improved chemical mechanical polishing (CMP) of sapphire
Author:
Abstract
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference50 articles.
1. Effect of abrasives on the glossiness and reflectance of anodized aluminum alloys
2. Design of ceria grafted mesoporous silica composite particles for high-efficiency and damage-free oxide chemical mechanical polishing
3. Effect of abrasive material properties on polishing rate selectivity of nitrogen-doped Ge2Sb2Te5 to SiO2 film in chemical mechanical polishing;Jin-Hyung;J. Mater. Res.,2008
4. Plasticity and fracture of sapphire at room temperature: Load-controlled microcompression of four different orientations
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