Applications of the Xia Scanning Photoemission Spectromicroscope for Element Identification on Material Surfaces

Abstract

AbstractThe Second Generation Scanning Photoemission Microscope at the beamline X1A of the National Synchrotron Light Source (NSLS), X1A SPEM II, is designed for spatially resolved elemental and chemical analysis by X-ray Photoelectron Spectroscopy (XPS) on material surfaces. Based on Fresnel Zone Plate (ZP) microfocusing techniques with the use of a bright and coherent photon source, this microscope is capable of acquiring XPS spectra from a small area irradiated by the focused beam and taking element-specific (using photopeaks) or chemical-state-specific (by detecting the chemical core level shifts) images with a spatial resolution defined by the focused spot size.