Aluminum Particle Formation in the GaS Phase of a Low Pressure Chemical Vapor Deposition Reactor Using Dimethylethylamine Alane (AlH3) as a Precursor

Abstract

ABSTRACTParticle formation in the gas phase during the chemical vapor deposition of Al using dimethylethylamine alane was studied. Typical sizes of the crystalline Al particles monitoredwere in the range 20 nm to 1000 nm. Introducing trace amounts of H2O, CO and O2 into the reactor during the flow of the precursor caused an increase in the number of particles. Our results suggested that Al particle formation was induced by impurities in the gas phase although competing mechanisms could not be ruled out.