The adsorption and thermal decomposition of trimethylamine alane on aluminum and silicon single crystal surfaces: kinetic and mechanistic studies-Reference-Cited by-同舟云学术

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The adsorption and thermal decomposition of trimethylamine alane on aluminum and silicon single crystal surfaces: kinetic and mechanistic studies

Published:1990-10 Issue:1-2 Volume:236 Page:77-84
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Dubois Lawrence H.,Zegarski Bernard R.,Kao Chi-Tzu,Nuzzo Ralph G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference26 articles.

1. Surface organometallic chemistry in the chemical vapor deposition of aluminum films using triisobutylaluminum: .beta.-hydride and .beta.-alkyl elimination reactions of surface alkyl intermediates

2. Summary Abstract: Surface chemical reactions in the metal–organic chemical vapor deposition of aluminum films

3. C.-T. Kao, B.E. Bent, B.R. Zegarski, L.H. Dubois and R.G. Nuzzo, in preparation.

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3. Investigation of the kinetics of the chemical vapor deposition of aluminum from dimethylethylamine alane: experiments and computations;physica status solidi (c);2015-05-13

4. Synthesis and Reactions of a Redox-Active α-Diimine Aluminum Complex;Organometallics;2013-02-28

5. Organic surfaces exposed by self-assembled organothiol monolayers: Preparation, characterization, and application;Progress in Surface Science;2009-07

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