Growth of 130 μm Thick Epitaxial KNbO3 Film by Hydrothermal Method

Abstract

ABSTRACTKNbO3 thick films were deposited on (100)c SrRuO3//(100)SrTiO3 substrates at 240 °C for 3 h by hydrothermal method. Film thickness increased linearly with increasing the deposition number of times and 130 μm thickness was achieved by the 6 time deposition. XRD analysis showed the growth of epitaxial orthorhombic films with the mixture orientation of (100), (010) and (001). Cross-sectional SEM observation showed that the 130 μm-thick film was dense and no obvious voids inside the film. In addition, the crystal structure change along film thickness direction was not detected from the cross-sectional Raman spectral observation.