Dual Function Polyvinyl Alcohol Based Oxide Precursors for Nanoimprinting and Electron Beam Lithography

Abstract

ABSTRACTOrdered arrays of crystalline complex oxides nanostructures were synthesized onto single crystal insulating substrates using aqueous polyvinyl alcohol based electron beam resist precursors. The irradiated zones are insoluble in water (negative-tone resist) due to the electron induced cross linking of polyvinyl alcohol. The subsequent high temperature treatment of the developed precursor samples leads to the formation of ordered arrays of nanodots for low irradiation doses. For high irradiation dosages, epitaxially and oriented nanowires are obtained. These same precursors were shown to be nanoimprintable on single crystal substrates. This allows for future dual processing of a single precursor film gaining nano-structuration from both electron beam and nanoimprint lithography methods.