Particle Removal from Semiconductor Surfaces Using a Photon-Assisted, Gas-Phase Cleaning Process
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Engineering
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1. Laser-induced bound and metastable states in bound-continuum systems
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1. Laser Cleaning of Particles from Silicon Wafers: Capabilities and Mechanisms;Solid State Phenomena;2005-04
2. Excimer laser cleaning for microelectronics: modeling, applications, and challenges;Laser Applications in Microelectronic and Optoelectronic Manufacturing IV;1999-07-15
3. Liquid Explosive Evaporative Removal of Submicron Particles from Hydrophilic Oxidized Silicon Surfaces;The Journal of Adhesion;1997-02
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