Author:
Astakhov Oleksandr,Carius Reinhard,Petrusenko Yuri,Borysenko Valeriy,Barankov Dmitry,Finger Friedhelm
Abstract
AbstractThe defect density in thin film silicon was increased using low temperature 2MeV electron irradiation up to a factor of 1000. More than 30 samples of different structure from highly crystalline to amorphous were prepared with PECVD and irradiated to study the dynamics of defect accumulation and role of the material structure in this process.
Publisher
Springer Science and Business Media LLC
Cited by
7 articles.
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