Author:
Zhao X.,Magtoto N.P.,Kelber J. A.
Abstract
AbstractThe interactions of sputter-deposited ruthenium with organosilicate glass (OSG) at 300 K have been studied by x-ray photoelectron spectroscopy (XPS) for Ru coverages from ∼ 0.1 monolayer to several monolayers, using in-situ sample transfer between the deposition and analysis chambers. The results indicate Stranski-Krastanov (SK) type growth, with the completion of the first layer of Ru at an average thickness corresponding to 1 monolayer average coverage. Ru(0) is the only electronic state present. XPS core level spectra indicate weak chemical interactions between Ru and the substrate. A less pronounced tendency towards SK growth was observed for Ru deposition on parylene. Deposition of Ru on OSG followed by electroless deposition of Cu resulted in the formation of a shiny copper film that failed the Scotch Tape test. Results indicate failure mainly at the Ru/OSG interface.
Publisher
Springer Science and Business Media LLC
Cited by
6 articles.
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