Synthesis of silicon-based polymerized films by excimer laser ablation deposition of hexaphenyldisilane

Abstract

A new method of synthesizing silicon-based polymer films by excimer laser ablation of hexaphenyldisilane (HPDS) has been studied. The polymerized films were formed on a substrate by laser ablation deposition of HPDS at 248 nm. The structure of the polymerized films depended strongly on the laser fluence and repetition rates. The thermal stability and hardness of the deposited films were estimated by thermogravimetry and a Vickers microhardness meter. The films showed good thermal stability, depending on the laser processing parameters.