Thermally Stable Polyoxocarbosilane Thin Films by Pulsed IR Laser Ablation of Poly[oxy(tetramethyldisilane-1,2-diyl)]-Reference-Cited by-同舟云学术

Thermally Stable Polyoxocarbosilane Thin Films by Pulsed IR Laser Ablation of Poly[oxy(tetramethyldisilane-1,2-diyl)]

Published:2002-02-19 Issue:3 Volume:14 Page:1242-1248
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Pola Josef¹,Kupčík Jaroslav¹,Blechta Vratislav¹,Galíková Anna¹,Galík Aftanas¹,Šubrt Jan¹,Kurjata Jan¹,Chojnowski Julian¹

Affiliation:

1. Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 165 02 Prague, Czech Republic, Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 250 68 Řež near Prague, Czech Republic, and Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, 90396 Lodz, Poland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm0112338

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5. Arrival time measurements of films formed by pulsed laser evaporation of polycarbonate and selenium

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