Friction and wear of argon-implanted silicon crystals

Author:

Lekki J.,Stachura Z.,Preikschas N.,Cleff B.,Cholewa M.,Legge G.J.F.

Abstract

Silicon 〈111〉 single crystals were implanted with 70 keV Ar ions to the dose of 1017 ions/cm2. Next, the friction coefficient between a Si crystal and a hard steel ball was measured using a pin-on-disk setup in air and in vacuum. The wear tracks were measured using a surface profilometer. For measurements performed in vacuum, a strong influence of implantation on friction force and wear tracks was found. The microstructure of the samples was subsequently investigated using RBS, ERD, and x-ray diffraction (XRD) techniques. Micro-RBS measurements showed that Ar had been removed from the wear tracks, despite their continued exhibition of low friction.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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