Dependence of the mechanical and structural properties of (Ti,Al)N films on the nitrogen content

Abstract

(Ti,Al)N films with increasing nitrogen content were grown by reactive cosputtering and characterized by auger electron spectroscopy, grazing x-ray diffraction, polarization curves, electrochemical impedance spectroscopy, nanoindentation, and atomic force microscopy. For Ti/Al ≈ 1 the Ti1−x AlxN phase is always present, but lower nitrogen contents lead to an additional phase, probably α–Ti(Al), which causes a decrease in hardness and Young's modulus. The increase of nitrogen content results ina decrease of surface roughness or a more compacted surface coating, according to the impedance results.