(Ti1−xAlx)N coatings by plasma‐enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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(Ti1−xAlx)N coatings by plasma‐enhanced chemical vapor deposition

Published:1994-07 Issue:4 Volume:12 Page:1602-1607
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Lee Sang‐Hyeob,Ryoo Ho‐Joon,Lee Jung‐Joong

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579362

Cited by 49 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal stability, mechanical properties, and tribological performance of TiAlXN coatings: understanding the effects of alloying additions;Journal of Materials Research and Technology;2022-03

2. Influence of Si doping on the microstructure and hardness of an AlTiSiN coating deposited by low pressure chemical vapor deposition;Ceramics International;2021-09

3. Effect of annealing on the microstructure and mechanical properties of Ti0.17Al0.83N coating prepared by low pressure chemical vapor deposition;Surface and Coatings Technology;2021-04

4. Kinetic analysis of face-centered-cubic Ti1−Al N film deposition by chemical vapor deposition;Materials Science and Engineering: B;2021-02

5. Oxygen diffusion in columnar TiAlSiN coatings investigated by electron microscopy;Thin Solid Films;2016-10

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