Author:
Booske J. H.,Zhang L.,Wang W.,Mente K.,Zjaba N.,Baum C.,Shohet J. L.
Abstract
It is established that nitridation of aluminum (Al) 6061-T4 by plasma source ion implantation (PSII) can dramatically enhance the pitting corrosion resistance of this alloy in marine environments (i.e., chlorine-ion-bearing aqueous solutions or humid atmospheres). Corrosion tests and microstructure analyses establish that the mechanism for successful passivation against chloride-induced pitting corrosion involves the formation of a multilayered microstructure, including the presence of a continuous layer of aluminum-nitride (AlN). Important process variables are the implantation voltage and the nitrogen dose (or total implantation time), as these two variables establish the implanted nitrogen concentration. Too high or too low an implanted nitrogen concentration will not yield the continuous AlN layer required for good corrosion resistance. PSII is attractive for this application as it provides for uniform, conformal implantation of irregularly shaped objects without masking, beam rastering, or object rotation.
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
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4. 15. The several values recorded as “unresolvable” in Table III were associated with very thin hysteresis loops from which it was difficult to ascertain the indicated parameter value. Such thin hysteresis loops are generally indicative of good resistance to pitting corrosion. This fact is further corroborated by the highly noble values of the other resolvable potential parameters in Table III.
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