Quantitative X-Ray Diffraction From Superlattices

Abstract

The physical properties of superlattices have been the subject of considerable interest because a wide range of phenomena associated with very thin films, interfaces, and coupling effects can be studied. Recent areas of activity in metallic superlattices include antiferromagnetic coupling of ferromagnetic layers across nonmagnetic spacer layers, giant magnetoresistance, magnetic surface anisotropy, low-dimensional superconductivity, and anomalous mechanical properties. All of these phenomena are strongly affected by the chemical and physical properties of the individual layers and by the superlattice structure. Therefore, a detailed understanding of the properties of superlattices requires a nondestructive, quantitative determination of the superlattice structure.Because superlattices are not in thermodynamic equilibrium, their structure is sensitive to preparation methods and growth conditions. A dramatic example of superlattice structural dependence on growth conditions is shown in Figure 1, for sputtered Nb/Si superlattices. Increasing the Ar pressure during sputtering decreases the kinetic energy of the deposited atoms, thereby changing their surface mobility, and thus altering growth dynamics. Figure 1 shows the low-angle x-ray diffraction and cross-sectional transmission electron microscopy (TEM) images of [Nb(35 Å)/Si(25 Å)]40, superlattices sputtered in, respectively, 3 and 15 mTorr of Ar. The TEM image of the 3 mTorr superlattice clearly shows the smooth and continuous layering across the entire cross section of the image (≈5 μm). This is characteristic of sputtered metal/semiconductor superlattices used for x-ray optics.