Crystallization Of Silicon Thin Films Prepared By Ecr Pecvd

Abstract

ABSTRACTSilicon thin films were deposited by Electron Cyclotron Resonance PECVD using silane as a source gas at room temperature. Deposited films were crystallized either by conventional furnace annealing(FA) or by rapid thermal annealing (RTA) process. The films deposited on SiO2/Si wafer substrates were Amorphous or microcrystalline depending on the microwave power. Deposited films were annealed at 600TC in a furnace. As expected, higher crystallinity was obtained in the case of the Amorphous films than the microcrystalline films after 7.5 hours annealing. It took 15 hours at 600δC for the Amorphous films to reach their maximum crystallinity in case of FA, but it only took 1 second at 900 δC for RTA. In addition, it was shown that RTA can be applied to the rapid crystallization of Amorphous silicon thin films deposited on a fused quartz substrate utilizing a new film structure.