Effect of Grain Boundary Segregation on the Transbarrier Conductivity of Polycrystalline Silicon

Abstract

AbstractThe conductivity of single grain boundaries of electronic grade, Bridgman grown polycrystalline silicon samples was measured using the dc polarization technique with the aim of detecting any influence on the carrier transport regime resulting from the segregation of oxygen and carbon, which, by themselves, should behave as electrically inactive impurities. To this scope as grown samples and samples heat treated at 1123 and 1223 K, differing in their initial oxygen and carbon content, were used and the conductivity measured in the 298-100 K range.The results indicate that for both the carbon rich and for the oxygen rich samples the conductivity across the grain boundaries is of the thermally activated type and that it could be discussed in terms of carriers which are thermally emitted over the barrier and cross the barrier in the limit of the short mean free path.Samples which do not present a net excess of oxygen or carbon, apparently behave as single crystal specimens, instead.The deconvolution of the I-V curves is then used for obtaining the densitl of the interface states responsible of the set-up of the grain boundaries barrier, whose shape supports a completely new hypothesis about the configuration of the impurity cloud at the grain boundaries.