Real time In Situ X-Ray Topographic Observation of Deformation of Single Crystals and Thin Films

Author:

Zhao Z. B.,Hershberger J.,Chiaramonti A.,Rek Z. U.,Bilello J. C.

Abstract

ABSTRACTAn experimental apparatus, which is capable of performing real time in situ X-ray topographic observation of deformation process via synchrotron white beam topography, has been developed. This device enables both tensile data (load-displacement) and topographic images to be recorded simultaneously. It has been utilized to study the deformation behaviors of crystals of Mo and W.These specimens have been subject to mechanical cycling with increasing load, and their deformation processes have been observed in real time and in situ via x-ray topography. This leads to the observation of several phenomena, which would have been difficult to reveal by other experimental techniques. They include stress concentration, microyielding, reversible variation of contrasts and stress relaxation. In addition, the deformation behaviors of small angle grain boundaries have also been examined. Furthermore, the specimens can be heated through a heating device attached to the tensile stage, which allows high temperature topography to be performed in real time. The technique has been applied to the Ta films on Si (100) substrates. With increasing temperature, the topographic observations have revealed that the Ta films yield, fracture and then proceed to delaminate from their substrates.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Reference15 articles.

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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Laue transmission diffraction optics for thin film stress calculation;Journal of Applied Physics;2003-07

2. Observation of the adhesion of thin Ta polycrystalline films to Si wafers via in situtopography/radiography;Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences;1999-10

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