Observation of the adhesion of thin Ta polycrystalline films to Si wafers via in situtopography/radiography
Author:
Affiliation:
1. Center for Nanomaterials Science, Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, MI 48109, USA
2. Stanford Synchrotron Radiation Laboratory, Stanford University, CA 94309, USA
Publisher
The Royal Society
Subject
General Physics and Astronomy,General Engineering,General Mathematics
Link
https://royalsocietypublishing.org/doi/pdf/10.1098/rsta.1999.0457
Reference13 articles.
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4. Applications of synchrotron radiation topography to dynamic processes in single crystal materials
5. Mixed Mode Cracking in Layered Materials
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