A New Low Temperature Thin Film Deposition Process: Energetic Cluster Impact (ECI)-Reference-Cited by-同舟云学术

A New Low Temperature Thin Film Deposition Process: Energetic Cluster Impact (ECI)

Published:1995 Issue: Volume:388 Page:
ISSN:0272-9172
Container-title:MRS Proceedings
language:en
Short-container-title:MRS Proc.

Author:

Haberland H.,Leber M.,Moseler M.,Qiang Y.,Rattunde O.,Reiners T.,Thurner Y.

Abstract

AbstractA beam of metal cluster ions of variable size is deposited with variable kinetic energy on a substrate. Mirror-like and strongly adhering films are produced on unheated substrates for sufficiently high cluster impact energies. Numerical simulations provide the physical insight why this novel technique gives different, and sometimes superior results compared to conventional methods. Several examples are presented.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

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