Author:
Paku ,a K.,Baranowski Jacek M.,Leszczyn˜ski M.,Suchanek B.,Wojdak M.
Abstract
Growth of GaN/Al2O3 layers by MOVPE has been investigated. Precise optimization of the growth parameters results in films with extremely high electron mobility: 900 cm2/Vs at 300K and 4000 cm2/Vs at 77K. The influence of the growth parameters on film properties like morphology, crystallographic structure, and the concentration of electrically active defects is presented. The mechanism of dislocation density reduction is proposed to explain the obtained results.
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science
Cited by
8 articles.
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