Dielectric Properties Analysis in Paraelectric ZrTiO4 Thin Films

Abstract

ABSTRACTThe dielectric constants and dielectric losses of ZrTiO4 thin films deposited by DC magnetron reactive sputtering were investigated. The paraelectric properties were measured in the 100kHz range and compared with an equivalent circuit model. As the deposition temperature increased (up to 600°C), the dielectric losses (tanσ) decreased (down to 0.017±0.007), while the dielectric constants (ε) were in the range of 35±7. Post annealing at 800°C in oxygen for 2h reduced tanσ down to 0.005±0.001, higher than those of well-sintered bulk ZrTiO4.