Stoichiometry Control of Compound Semiconductors

Author:

Nishizawa Jun-Ichi,Suto Ken,Oyama Yutaka

Abstract

ABSTRACTVapor pressure control technology is successfully applied to the bulk crystal growth, epitaxial growth and diffusion process of ZnSe crystals. Surface morphology and the crystal quality are investigated by the optical microscope and the X-ray double crystal diffractometry as the function of the growth temperature and the applying Zn vapor pressure. The cathode luminescence is also measured to evaluate the optical properties and the effect of low temperature growth and the application of Zn vapor pressure are demonstrated, p-type ZnSe crystals are grown from the Se solution with group Ia element as a dopant under controlled Zn vapor pressure, p-n junction diodes are also prepared by the Ga diffusion from Zn solution under Se vapor pressure. Emission spectra from the p-n junction and its Zn and Se vapor pressure dependencies are also presented.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Liquid Phase Epitaxy for Light Emitting Diodes;Liquid Phase Epitaxy of Electronic, Optical and Optoelectronic Materials;2007-09-04

2. Stoichiometrically Dependent Deep Levels in Sn‐Doped n‐Type InP;Journal of The Electrochemical Society;1999-03-01

3. Stoichiometry-dependent deep levels in p-type InP;Journal of Applied Physics;1997-04

4. Stoichiometry‐dependent deep levels inn‐type InP prepared by annealing under controlled phosphorus vapor pressure;Journal of Applied Physics;1996-08

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