Selective Doping of 4H-SiC by Aluminum/Boron Co-diffusion

Abstract

ABSTRACTBased upon graphite mask, selective aluminum/boron doping of SiC by thermal diffusion has been successfully realized in a temperature range of 1800 to 2100°C. Secondary ion mass spectrometry (SIMS) was used to identify the doping profiles, which showed very high aluminum concentration (5×1019 cm−3) near the surface and linearly graded boron profile up to several micrometers in depth. Hall-effect measurement was also employed to obtain the carrier concentration, which showed more than 1019 cm−3 carrier concentration at room temperature. Cathodoluminescence (CL) image clearly illustrated the locally diffused pattern. In addition, planar p-n diodes based upon this technique were fabricated and current-voltage (I-V) characteristics were measured. Excellent rectification property has been obtained. Built-in voltage of 2.9 V in the formed p-n junction was obtained by capacitance-voltage (C-V) measurement.