Photosensitive Capacitance Effect In High-purity Semi-insulating 4H-SiC

Author:

Register Joseph,Saddow Stephen E.,Boulais Kevin

Abstract

AbstractWe demonstrate a novel optically tunable photosensitive capacitor (PSC) made from high-purity semi-insulating 4H-SiC. Photosensitive capacitors can provide continuously variable reactive tuning in RF circuitry or enable capacitive-optical sensing applications. Unlike varactors, PSCs often do not require a DC bias voltage to operate. To demonstrate the effect, we fabricated several 1cm x 1cm square photocapacitor devices from bulk material using metal-evaporated Ti/Au contacts using a simple planar parallel-gap geometry. IV curves were taken of the devices using an HP-4145B semiconductor parameter analyzer to verify Schottky behavior as a function of DC bias. The samples were then illuminated with pulsed below-bandgap 470 nm and 590 nm high intensity LED light sources. The resulting data demonstrated an increase in capacitance, Cs, and a drop in resistance, Rs, with increasing optical intensity incident on the device. The observed shifts in both Cs and Rs were repeatable. At a measurement frequency of 33 kHz. Cs increased from its nominal value of 186.7 pF to 575.6 pF while Rs dropped from 150.0 kΩ to 22.4 kΩ. This demonstrates the existence of the photocapacitance effect in high-purity semi-insulating 4H-SiC and thus warrants further investigation. The underlying phenomenon of the effect is suspected to be light interaction with the dominant deep level traps through the Shockley–Read–Hall (SRH) recombination mechanism.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3