Spontaneous Crystalline Multilayer Formation in Ni Implanted Al at 100 K

Abstract

AbstractThe microstructure evolution of aluminum implanted with nickel at 5 MeV and at 100 K to a local concentration of 25 at. % is described. Transmission Electron Microscopy (TEM) observa- tions and Rutherford Backscattering Spectrometry (RBS) experiments are conducted to deter-mine the Ni profile and the microstructure of the implanted samples. For lower Ni concentration, it has been previously observed that Al0.75Ni0.25 amorphous precipitates are formed together with a high dislocation density. When the Ni concentration reaches 25 at. %, a new crystalline multi-layered microstructure is observed: the TEM observations reveal the presence of well-defined crystalline layers separated by sharp interfaces. To our knowledge, it is the first time that such a structure is observed without further annealing of the implanted sample. A series of mechanisms describing the formation of the crystalline multilayer are briefly discussed. It is argued that its formation is the result of a recrystallization front produced by the exothermal amorphous to crystal transformation.