Modification of Si(001)/SiO2 Interfaces by Nitric Oxide Treatments: An Electron Paramagnetic Resonance Study

Abstract

ABSTRACTThe modification of the Si(001)/SiO2 interface and the related interface defect reduction by thermal treatments in nitric oxide (NO) have been studied by Electron Paramagnetic Resonance spectroscopy for 630Å thick and ultrathin (28Å) oxides. The effects of annealing temperature, annealing time and rapid (RTN) or furnace annealing have been explored. Our results show that an appropriate NO treatment can drastically reduce the defect densities if, in addition to N incorporation in the transition layer near the interface, the thermal relaxation of the nitrided oxide is allowed. Our results indicate that NO treatment can lead to “defect free” Si/SiO2 interfaces.