Model for electron-beam-induced crystallization of amorphous Me–Si–C (Me = Nb or Zr) thin films-Reference-Cited by-同舟云学术

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Model for electron-beam-induced crystallization of amorphous Me–Si–C (Me = Nb or Zr) thin films

Published:2014-11-21 Issue:23 Volume:29 Page:2854-2862
ISSN:0884-2914
Container-title:Journal of Materials Research
language:en
Short-container-title:J. Mater. Res.

Author:

Tengstrand Olof,Nedfors Nils,Andersson Matilda,Lu Jun,Jansson Ulf,Flink Axel,Eklund Per,Hultman Lars

Abstract

Abstract

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference37 articles.

1. C-Zr (Carbon-Zirconium)

2. Silicon Carbide - Materials, Processing and Applications in Electronic Devices

3. Radiation damage in the TEM and SEM

4. Transmission Electron Microscopy

5. Bodycote Prize 2006: Best Technical/Scientific Paper Novel ceramic Ti–Si–C nanocomposite coatings for electrical contact applications

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