Analysis of Radical Reaction on Growing Surface During Si Epitaxy by Photo-Cvd

Abstract

ABSTRACTThe growth mechanism of Si film at low temperature on Si(100) by photo-CVD was theoretically analyzed by using reaction models both in the gas phase and on the growing surface. We introduced three surface reactions; the growth of Si from SiH3 radicals, the dangling bond termination by atomic hydrogen and the abstraction of bonding hydrogen by SiH3 radicals. We assumed that the film structure is determined by the hydrogen surface coverage ratio “ø” and the parameters of the surface reaction model were determined from the experimental results. The theoretical analysis explained well the experimental data on the growth rate.