Growth of a-Si:H Films by Remote Plasma Enhanced CVD (RPECVD)
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Engineering
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Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Properties and Characterization of Dielectric Thin Films;Schott Series on Glass and Glass Ceramics;2003
2. Defect formation ina-Si:H;Physical Review B;1990-06-15
3. Chemical-equilibrium model of optimala-Si:H growth fromSiH4;Physical Review B;1990-04-15
4. Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma;Applied Physics Letters;1989-05-08
5. Deposition of a-Si:H Films with a Remote Hydrogen Plasma;MRS Proceedings;1989
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