Author:
Spiller Eberhard,Watson IBM T. J.
Abstract
AbstractThe applications of multilayer x-ray mirrors to x-ray lithography are reviewed. Topics included are: multilayer performance and characterization, testing and fabrication of large mirrors with figure errors in the Angstrom range, multilayer x-ray masks, and collimators.
Publisher
Springer Science and Business Media LLC
Reference39 articles.
1. Low‐Loss Reflection Coatings Using Absorbing Materials
2. Multilayer Optics for the Soft X-Ray and Extreme Ultraviolet
3. “Multilayer x-ray mirrors: Interfacial roughness, scattering and image quality,”;Spiller;J. Appl. Phys,1993
4. Computer search for layer materials that maximize the reflectivity of X-ray multilayers
5. “20:1 projection soft x-ray lithography using tri-level resist,”;Jewell;Proc. SPIE,1990
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献