Materials Issues In X-Ray Lithography

Abstract

AbstractIn this paper, an outline of materials-related activities in the national X-Ray Lithography Program is given. The program is directed towards the development of sub-quarter micron design-rule x-ray lithography together with the ancillary technologies required to fabricate defect-free x-ray masks. Work done at the Naval Research Laboratory is highlighted and used for examples. Most materials related work occurs in conjunction in the x-ray mask fabrication pro. cess. Topics discussed include electron beam-matter interaction in the mask patterning process, membane fabrication, stress control in thin membranes, reactive-ion etching of absorber-layers, mask inspection and repair.