Author:
Viswanathan R.,Seeger D.,Bright A.,Bucelot T.,Pomerene A.,Petrillo K.,Blauner P.,Agnello P.,Warlaumont J.,Conway J.,Patel D.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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3. Development of a fast and high resolution e-beam process for the fabrication of X-ray masks with CD of 0.15 μm;Microelectronic Engineering;1995-02
4. Deep-UV Microlithography;Ultraviolet Laser Technology and Applications;1995
5. Materials Issues In X-Ray Lithography;MRS Proceedings;1993