How the sputtering process influence structural, optical, and electrical properties of Zn3N2 films?
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science
Link
http://link.springer.com/content/pdf/10.1557/mrc.2018.50.pdf
Reference20 articles.
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2. R. Long, Y. Dai, L. Yu, M. Guo, and B. Huang: Structural, electronic, and optical properties of oxygen defects in Zn3N2. J. Phys. Chem. B 111, 3379–3383 (2007).
3. T. Oshima, and S. Fujita: (111)-oriented Zn3N2 growth on a-plane sapphire substrates by molecular beam epitaxy. Jpn. J. Appl. Phys. 45, 8653–8655 (2006).
4. D.E. Partin, D.J. Williams, and M. O’Keefee: The Crystal Structures of Mg3N2 and Zn3N2. J. Solid State Chem. 132, 56–59 (1997).
5. M. Futsuhara, K. Yoshioka, and O. Takai: Structural, electrical and optical properties of zinc nitride thin films prepared by reactive rf magnetron sputtering. Thin Solid Films 322, 274–281 (1998).
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