Plasma Synthesis of Rare Earth Doped Integrated Optical Waveguides

Abstract

AbstractWe describe a novel means for the production of optically active planar waveguides. The technique makes use of a low energy plasma deposition. Cathodic-arc-produced metal plasmas are used for the metallic components of the films and gases are added to form compound films. Here we discuss the synthesis of A12-xErxO3 thin films. The erbium concentration (x) can vary from 0 to 100% and the thickness of the film can be from Angstroms to microns. In such material, at high active center concentration (x=l% to 20%), erbium ions give rise to room temperature 1.53μm emission which has minimum loss in silica-based optical fibers. With this technique, multilayer integrated planar waveguide structures can be grown, such as Al2O3/Al2-xErO3/A12O3/Si, for example.