In Situ Multi-Wavelength Ellipsometric Control of Thickness and Composition For Bragg Reflector Structures

Abstract

AbstractWe have demonstrated real-time feedback control of thickness and composition for Bragg reflector structures using in situ multi-wavelength ellipsometry. This demonstration was performed under conditions which were not ideal for ellipsometric measurements: the angle of incidence for the ellipsometric measurement beam was far away from the Brewster angle, substrate rotation was enabled (which caused an angular wobble in the measurement beam), and strain effects were present in the ellipsometer windows. Furthermore, to simulate drift in the MBE system (and test the effectiveness of the ellipsometer control), the Ga effusion cell was ramped to change the Ga flux by 50% during two of the growth runs. Results of the growth control precision and accuracy are presented; the influence of the non-ideal measurement conditions on the ellipsometer growth control capability is also discussed.