Optical Spectroscopic Profiling of Off-Axis Rf Sputtering

Abstract

AbstractThe optical emission spectra resulting from if magnetron sputtering a BaTiO3 target were observed to survey substrate position implications. A collimated optical fiber bundle parallel to the plane of the sputter target was translated vertically and horizontally to spectroscopically profile the sputter process. The resulting Ar, O, Ba, and Ti emission intensity contours and the O/Ba and Ba/Ti intensity ratio contours suggest substrate positions that should provide uniform undistorted films. Films deposited on sapphire substrates were found to differ in orientation, lattice parameter, and index of refraction. The optimum offaxis deposition position shifted as the chamber pressure was varied.