Author:
Chaldyshev V.V.,Brunkov P.N.,Chernigovskii A. V.,Moskalenko A.,Bert N.A.,Konnikov S. G.,Preobrazhenskii V. V.,Putyato M. A.,Semyagin B. R.
Abstract
AbstractAccumulation of electrons and holes in GaAs layers, that contained As clusters and were sandwiched between n- and p-type buffer GaAs layers, was revealed by capacitance-voltage measurements. As a result of majority-carrier accumulation, expansive depletion regions are formed in the adjoining buffer layers. Simulation of the capacitance-voltage characteristics, based on a numerical solution of the Poisson equation, shows that the accumulated charge density is ∼1 × 1012 cm−2, which is comparable with the concentration of As nanoclusters determined by transmission electron microscopy. The levels where the electrons or holes are accumulated lie close but above the GaAs midgap. A strong difference in the emission rates of the accumulated electrons and holes has been revealed.
Publisher
Springer Science and Business Media LLC