Infrared Study of Amorphous Crystalline Phase Transition in an Annealed Amorphous Hydrogenated Silicon Carbon Alloy Film

Abstract

ABSTRACTAn amorphous hydrogenated silicon carbon alloy film (a Si1 x Cx :H with x = 0.29) was prepared by glow discharge decomposition of a silane and ethylene gas mixture. A careful and detailed investigation of the infrared absorption was undertaken in the range 400 to 4000 cm1 for both the as deposited (T =250°C) and annealed (up to 1200°C) film. This study demonstrates clearly that there is a structural change from amorphous to microcrystalline at T =8000C and then to crystalline phase at T a=1200° C.