Low-pressure metalorganic chemical vapor deposition of photoluminescent Eu-doped Y2O3 films

Author:

West Gary A.,Beeson K. W.

Abstract

We have produced thin photoluminescent films of Eu-doped Y2O3 (Y2O3: Eu) by low-pressure metalorganic chemical vapor deposition (MOCVD). Yttrium and europium β-diketonate precursors are thermally decomposed in a hot-walled MOCVD reactor in the presence of oxygen at a total reactor pressure of 1 Torr. The films are microcrystalline and photoluminescent as-deposited and contain <1 at.% of carbon contamination. Subsequent annealing at 1200°C in air enhances and stabilizes the luminescence. We have measured the photoluminescent lifetimes of the MOCVD films as a function of temperature for the Eu+35D17F1 and 5D07F2 transitions using excimer laser excitation at 248 nm. We present a kinetic model which can account for the observed emission lifetimes from 20–1000°C.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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