Spectroscopic Diagnostics and Kinetics of Low Pressure Processing Plasmas

Abstract

AbstractA review is presented of a negative glow model of low frequency, low pressure plasma reactors and the salient features are described using silane mixtures as the example.The input requirements for this model and similar models are also discussed in order to establish the sensitivity of the homogeneous plasma reactions to operational conditions.Calculations are presented to demonstrate the sensitivity to mixture ratios, buffer gas type and power loading.