Author:
Fiory A. T.,Schietinger C.,Adams B.,Tinsley F. G.
Abstract
ABSTRACTA two-channel optical-fiber pyrometry technique for simultaneous measurement of thermal radiance and emittance was used to measure and control the temperature of silicon wafers heated by quartz-halogen-tungsten lamps in various rapid-thermal processors, including an A.G. Associates Heatpulse. The ripple method dynamically determines emittances by sensing time-dependent components in radiation from the lamps and radiation reflected by the wafer surface. Wafers were coated with films of various textures and patterns to test the technique over a range of surface emittances spanning about an order of magnitude. Temperature accuracies of at least ±5°C are achievable from 650°C to 1050°C, and above, for pyrometry at lμm wavelength.
Publisher
Springer Science and Business Media LLC
Reference3 articles.
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