Erbium Ion Implantation for Optical Doping

Abstract

ABSTRACTErbium is a rare-earth ion which, when incorporated in a solid in the trivalent state, shows characteristic intra-4f emission at 15 µm, an important telecommunication wavelength. A review is given of recent work in the area ofEr ion implantation into soda-lime silicate and AI2O3 optical waveguide films, LiNbO3 and silicon. Structural and optical characteristics are discussed and future challenges for this exciting new field are described.