30 Years of Electromigration Research: A Grand Masters' Perspective

Abstract

At the MRS Spring Meeting in San Francisco this year, a special historical session was held in the symposium on Materials Reliability in Microelectronics to reflect upon thirty years of research into electromigration as a failure mode in integrated circuits. Six of the original “discoverers” of electromigration as a reliability issue were invited to speak of their work and to relate stories of the early days of these historic efforts.